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Welcome
to the XACTIX Website
XACTIX,
Inc. develops and produces equipment for manufacturing micro electromechanical
systems (MEMS).
Manufacturing
MEMS devices requires adding new manufacturing steps to the standard
IC process. These new steps require new, specialized equipment
to maximize yield and productivity. XACTIX leverages its unique
combination of expertise in instrument and equipment design, semiconductor
materials processing, micro machining and fabrication, and MEMS
manufacturing to design and build leading-edge MEMS process equipment.
Xetch® Systems
XACTIX
is the manufacturer of the Xetch® xenon difluoride
(XeF2) etching systems, the X3
Series™ for
commercial customers and the e1
Series™ for university
customers and the newly introduced X3M and XT series.
These
dry isotropic etching tools are popular in the MEMS community
due to high selectivity to silicon versus many standard films
including photoresist, silicon dioxide, silicon nitride,
and aluminum.
The Xetch® systems are particularly well suited for release,
but are certainly not limited to MEMS applications and are
useful
for many applications where highly selective isotropic silicon
etching is required. For more information on the unique advantages
of xenon difluoride etching, please look at our Unique
Capabilities of Xenon Difluoride for Releasing MEMS brochure.
CVE
Module for Volume Production
The
CVE module was jointly designed by XACTIX and its partner Surface
Technology Systems (STS). It includes a break through chamber design
which provides high etch rates, uniformity and efficiency. It is
designed
to fit on the STS cluster platforms allowing the integration of multiple
XeF2 modules with the full line of plasma modules availale from STS.
For more information see the press
release and the system brochure
Last
Updated July 18, 2008
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