e1

Built for simplicity, low cost of ownership and a small footprint, the Xetch® e1TM is the ideal solution for those seeking a low cost R&D xenon difluoride etching system.
  • Overview
  • Specifications
  • Software Control
  • Upgrades
  • Utility Requirements
  • Warranty & Installation
  • This table top etcher is ideal for universities and laboratories who do not need the performance of the Xetch® X4
  • Low cost, simple & reliable
  • Great for working with small samples and wafers
  • Includes the etch unit, PC with keyboard and mouse, flat panel display, pump, power control box and manual

Dimensions and Weight

  • System dimensions (not including PC or pump): 640 mm wide X 610 mm deep X 820 mm high
  • Weight approximately 100 kg

System Geometry

The Xetch® e1 is delivered in its standard configuration with one xenon difluoride expansion chamber and the provision for the installation of one xenon difluoride source bottle (not included with the system).

Wafer capacity

The Xetch® e1 is designed to be manually loaded for superior substrate geometry flexibility. This flexibility is a key feature since it allows the easy processing of MEMS devices ranging from die sized devices, very fragile or thin substrates, and standard full wafers.

Wafer size limitations

The Xetch® e1 is designed to accommodate 6" wafers or smaller parts.

The Xetch® e1TM system provides a powerful but intuitive graphical user interface. It includes all of the features necessary for loading and unloading wafers, writing and storing recipes, system maintenance and system security. Its main features include:

  • Flat panel display and keyboard interface
  • Multi-user software interface with password protected access for each user
  • Password protected access to maintenance software
  • Recipe storage
  • Data logging with process run log exportable for viewing in spreadsheet applications
  • Logging and real time plotting of the pressure in the process chamber at a specified interval during etching

The following upgrades are available on the e1:
  • Imaging Upgrade
  • Microscope
  • Thin Metal Lid with Viewport
  • Quartz Showerhead Lid
  • Touch Screen
  • Heating Upgrade
  • Continuous Flow
  • Advanced Recipe Software Package
  • Advanced Experimentation Software & Hardware Package

Please see our upgrades page for more information.


  • 110 V/20 A or 220 V/10 A AC, for system including vacuum pump; computer and flat panel display are plugged in separately
  • Nitrogen line for process N2: 10-20 psi
  • Compressed Dry Air: 70-100 psi
  • 100 cfm fume exhaust from roughing pump, gas box, and chamber ventilation shroud
  • Stainless steel material is recommended for exhaust pipe

  • 1-year parts and labor warranty
  • Free software updates for one year
  • Designed to be easily installed by the customer