Xetch® Xenon Difluoride Etching Systems
Isotropic etching of silicon using xenon difluoride is an ideal solution for releasing MEMS devices. XeF2 shows nearly infinite selectivity to silicon over almost all standard semiconductor materials including photoresist, silicon dioxide, silicon nitride and aluminum. Being a vapor phase etchant, XeF2 avoids many of the problems typically associated with wet or plasma etch processes. For more information see our summary on the unique advantages of xenon difluoride etching.XACTIX offers the following xenon difluoride etching systems:
X4 Series™
The Xetch® X4 Series is the culmination of over a decade of XACTIX working with the most demanding customers. It represents the state of the art in XeF2 etching in a package designed for advanced research and pilot production.
The Xetch® X4 Series is the culmination of over a decade of XACTIX working with the most demanding customers. It represents the state of the art in XeF2 etching in a package designed for advanced research and pilot production.
e1 Series™
The Xetch® e1 Series is a simple & reliable, low cost xenon difluoride etching system for universities and laboratories who do not need the performance of XACTIX's Xetch® X4 Series. It is ideal for users who have a limited budget, or are part of a smaller group and who are working primarily with small samples but also need the capability to etch wafers.
The Xetch® e1 Series is a simple & reliable, low cost xenon difluoride etching system for universities and laboratories who do not need the performance of XACTIX's Xetch® X4 Series. It is ideal for users who have a limited budget, or are part of a smaller group and who are working primarily with small samples but also need the capability to etch wafers.
CVE Module for Volume Production
The CVE module was jointly designed by XACTIX and its partner SPP Process Technology Systems, Inc. (SPTS). It includes a breakthrough chamber design which provides high etch rates, uniformity and efficiency. It is designed to fit on the SPTS cluster platforms allowing the integration of multiple XeF2 modules with the full line of modules available from SPTS.
The CVE module was jointly designed by XACTIX and its partner SPP Process Technology Systems, Inc. (SPTS). It includes a breakthrough chamber design which provides high etch rates, uniformity and efficiency. It is designed to fit on the SPTS cluster platforms allowing the integration of multiple XeF2 modules with the full line of modules available from SPTS.
